I-Oem High Purity 99.95% Polish Thin Tungsten Plate Sheets Tungsten Sheets for Industry
Iiparamitha zeMveliso
Uphawu | HSG |
Umgangatho | I-ASTMB760-07;GB/T3875-83 |
IBanga | W1,W2,WAL1,WAL2 |
Ukuxinana | 19.2g/cc |
Ubunyulu | ≥99.95% |
Ubungakanani | Ukutyeba0.05mm min* Ububanzi300mm max*L1000mm max |
Umphezulu | Ukucoca kumnyama/kwealkali/ ukugudiswa |
Indawo yokunyibilika | 3260C |
Inkqubo | ukuqengqeleka okushushu |
ukwakheka kweekhemikhali
Ukuqulunqwa kweekhemikhali | ||||||||||
Umxholo wokungcola ( % ), ≤ | ||||||||||
Al | Ca | Fe | Mg | Mo | Ni | Si | C | N | O | |
Ibhalansi | 0.002 | 0.005 | 0.005 | 0.003 | 0.01 | 0.003 | 0.005 | 0.008 | 0.003 | 0.005 |
Ubungakanani kunye nokwahluka okuvumelekileyo
Ukutyeba | Ukutyeba Ukunyamezela | Ububanzi | Ukunyamezela Ububanzi | Ubude | Ukunyamezela Ubude | |
I | II | |||||
0.10-0.20 | ±0.02 | ±0.03 | 30-150 | ±3 | 50-400 | ±3 |
>0.20-0.30 | ±0.03 | ±0.04 | 50-200 | ±3 | 50-400 | ±3 |
> 0.30-0.40 | ±0.04 | ±0.05 | 50-200 | ±3 | 50-400 | ±3 |
> 0.40-0.60 | ±0.05 | ±0.06 | 50-200 | ±4 | 50-400 | ±4 |
>0.60-0.80 | ±0.07 | ±0.08 | 50-200 | ±4 | 50-400 | ±4 |
>0.8-1.0 | ±0.08 | ±0.10 | 50-200 | ±4 | 50-400 | ±4 |
>1.0-2.0 | ±0.12 | ±0.20 | 50-200 | ±5 | 50-400 | ±5 |
>2.0-3.0 | ±0.02 | ±0.30 | 50-200 | ±5 | 50-400 | ±5 |
>3.0-4.0 | ±0.03 | ±0.40 | 50-200 | ±5 | 50-400 | ±5 |
>4.0-6.0 | ±0.04 | ±0.50 | 50-150 | ±5 | 50-400 | ±5 |
Uphawu
Iqondo eliphezulu lokunyibilika, ukuxinana okuphezulu, ukumelana nobushushu obuphezulu be-oxidation, ubomi benkonzo ende, ukuxhathisa ukubola.
I-tungsten ityhubhu isetyenziswa ngokubanzi kwityhubhu yokukhusela i-thermocouple, i-sapphire crystal furnace kunye neziko lobushushu obuphezulu, njl.
Isicelo
Izicelo ze-Tungsten Plate:A99.95% ipleyiti ye-tungsten ecocekileyo
1. Amacandelo okumelana nokushisa: ikhuselo lobushushu, into yokufudumeza yesithando somlilo esiphezulu.
2. Iithagethi ze-Tungsten zokutshiza kwi-vacuum coating kunye ne-evaporation coating.
3. Amacandelo e-elektroniki kunye ne-semi-conduct.
4. Amacandelo afakwe kwi-ion.
5. Izikhephe zeTungsten zesapphire crystal furnaces kunye ne-vacuum furnaces.
6. Ishishini elingacacanga: Udonga lokuqala lwe-fusion reactors