Phezulu okucocekileyo 99.95% kuShishino lwaMandla e-Atomic oluLungileyo lwePlastiki yokuNxitywa kweResistance yeTantalum Rod/Bar Tantalum
Iiparamitha zeMveliso
| Igama lemveliso | 99.95% Tantalum ingot bar abathengi ro5400 tantalum ixabiso |
| Ubunyulu | 99.95% min |
| IBanga | R05200, R05400, R05252, RO5255, R05240 |
| Umgangatho | I-ASTM B365 |
| Ubungakanani | I-Dia(1~25)xMax3000mm |
| Imeko | 1.I-Hot-rolled/Cold-rolled;2.Ukucocwa kweAlkaline;3.Electrolytic Polish;4.Umatshini, ukucola;5.Ukunciphisa uxinzelelo loxinzelelo. |
| Ipropathi yeMechanical (Annealed) | iBanga;Amandla okuqina;Elongation min, % |
| (UNS), psi (MPa), psi(MPa)(2%), (1in. ubude begeji) | |
| (RO5200, RO5400), 30000 (207), 20000 (138), 20 | |
| Ta-10W (RO5255), 70000 (482), 60000 (414),15 | |
| Ta-2.5W (RO5252), 40000 (276), 30000 (207), 20 | |
| Ta-40Nb (RO5240), 35000 (241), 20000 (138), 25 | |
| Iimveliso ezenzelwe wena | Ngokomzobo, Iimfuno ezikhethekileyo ekuvunyelwene ngazo ngumthengisi kunye nomthengi. |
Inkcazo
| Ububanzi | Ukunyamezela kwe-Diameter | Ubude | Ukunyamezelana | |||
| intonga yokubumba | Iinduku ezikhutshiweyo | intonga eqengqelekayo | intonga yomhlaba | |||
| 3.0-4.5 | ±0.05 | - | ±0.05 | - | 500-1500 | + 5 |
| >4.5-6.5 | ±0.10 | - | ±0.10 | - | 500-1500 | + 5 |
| > 6.5-10.0 | ±0.15 | - | ±0.15 | - | 400-1500 | + 5 |
| >10-16 | ±0.20 | - | ±0.20 | - | 300-1200 | + 5 |
| >16-18 | ±1.0 | - | - | ±0.30 | 200-2000 | + 20 |
| >18-25 | ±1.5 | ±1.0 | - | ±0.40 | 200-2000 | + 20 |
| > 25-40 | ±2.0 | ±1.5 | - | ±0.50 | 150-4000 | + 20 |
| > 40-50 | ±2.5 | ±2.0 | - | ±0.60 | 100-3000 | + 20 |
| >50-65 | ±3.0 | ±2.0 | - | ±0.80 | 100-1500 | + 20 |
ItheyibhileⅠUkwakheka kweChemical yeTantalum Rod
| Ikhemistri ppm | ||||||||||||
| Inkcazo | Icandelo eliyintloko | Ukungcola okuphezulu | ||||||||||
| Ta | Nb | Fe | Si | Ni | W | Mo | Ti | O | C | H | N | |
| Ta1 | Intsalela | 300 | 40 | 30 | 20 | 40 | 40 | 20 | 150 | 40 | 15 | 20 |
| Ta2 | Intsalela | 800 | 100 | 100 | 50 | 200 | 200 | 50 | 200 | 100 | 15 | 100 |
| TaNb3 | Intsalela | <35000 | 100 | 100 | 50 | 200 | 200 | 50 | 200 | 100 | 15 | 100 |
| TaNb20 | Intsalela | 170000- 230000 | 100 | 100 | 50 | 200 | 200 | 50 | 200 | 100 | 15 | 100 |
| Ta2.5W | Intsalela | 400 | 50 | 30 | 20 | 30000 | 60 | 20 | 150 | 50 | 15 | 60 |
| Ta10W | Intsalela | 400 | 50 | 30 | 20 | 110000 | 60 | 20 | 150 | 50 | 15 | 60 |
Itheyibhile Ⅱ Iiyantlukwano ezivumelekileyo kwiDiameter yeTantalum Rods
| Ububanzi, intshi (mm) | Ukunyamezela, +/-intshi (mm) |
| 0.125~0.187 ngaphandle (3.175~4.750) | 0.003 (0.076) |
| 0.187~0.375 ngaphandle (4.750~9.525) | 0.004 (0.102) |
| 0.375~0.500 ngaphandle (9.525~12.70) | 0.005 (0.127) |
| 0.500~0.625 ngaphandle (12.70~15.88) | 0.007 (0.178) |
| 0.625~0.750 ngaphandle (15.88~19.05) | 0.008 (0.203) |
| 0.750~1.000 ngaphandle (19.05~25.40) | 0.010 (0.254) |
| 1.000~1.500 ngaphandle (25.40~38.10) | 0.015 (0.381) |
| 1.500~2.000 ngaphandle (38.10~50.80) | 0.020 (0.508) |
| 2.000~2.500 ngaphandle (50.80~63.50) | 0.030 (0.762) |
Isicelo
iiCapacitors;ukufakelwa kotyando kunye nezixhobo;imilomo ye-inki yejethi.
Isetyenziswe kwizixhobo zaselebhu.
Isetyenziswa endaweni yeplatinam.
Isetyenziselwa ukwenza ii-alloys ezinkulu kunye nokunyibilika kwe-electron-beam.
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